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机译:氧气氛退火对RF磁控溅射制造的Mn1.2Co1.5Ni0.3O4(+/-Δ)陶瓷膜的热稳定性的影响
Chinese Acad Sci Key Lab Funct Mat &
Devices Special Environm Xinjiang Key Lab Elect Informat Mat &
Devices Xinjiang Tech Inst Phys &
Chem 40-1 South Beijing Rd Urumqi Peoples R China;
Chinese Acad Sci Key Lab Funct Mat &
Devices Special Environm Xinjiang Key Lab Elect Informat Mat &
Devices Xinjiang Tech Inst Phys &
Chem 40-1 South Beijing Rd Urumqi Peoples R China;
Chinese Acad Sci Key Lab Funct Mat &
Devices Special Environm Xinjiang Key Lab Elect Informat Mat &
Devices Xinjiang Tech Inst Phys &
Chem 40-1 South Beijing Rd Urumqi Peoples R China;
Chinese Acad Sci Key Lab Funct Mat &
Devices Special Environm Xinjiang Key Lab Elect Informat Mat &
Devices Xinjiang Tech Inst Phys &
Chem 40-1 South Beijing Rd Urumqi Peoples R China;
Mn1.2Co1.5Ni0.3O4 +/- delta; Films; Electrical properties; Thermal stability; Thermistors;
机译:氧气氛退火对RF磁控溅射制造的Mn1.2Co1.5Ni0.3O4(+/-Δ)陶瓷膜的热稳定性的影响
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机译:退火温度对制备的Y型磁控溅射微波介电陶瓷薄膜的影响
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机译:氧浓度对超薄射频磁控溅射沉积铟锡氧化物薄膜作为光伏器件上电极的性能的影响
机译:快速热退火对RF磁控溅射技术制造ZNS薄膜结构和光学性质的影响