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首页> 外文期刊>CERAMICS INTERNATIONAL >Twinning and charge compensation in Nb2O5-doped SnO2-CoO ceramics exhibiting promising varistor characteristics
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Twinning and charge compensation in Nb2O5-doped SnO2-CoO ceramics exhibiting promising varistor characteristics

机译:NB2O5掺杂的SnO2-CoO陶瓷的孪生和电荷补偿表现出有前途的压敏电阻特性

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We investigated the effects of dual doping of SnO2 varistor ceramics with 1 mol% CoO and different amounts of Nb2O5 (0.1-2 mol%) on the formation of twin boundaries, microstructure development and electrical properties. Nb2O5 addition shifts densification to higher temperatures (up to 1430 degrees C), producing microstructures composed of twinned SnO2 grains. Already 0.1 mol% Nb2O5 triggers a three-fold increase in growth rate via the diffusion induced grain boundary mobility (DIGM). At 0.5 mol% of Nb2O5 chemical equilibrium is achieved and SnO2 grains undergo normal grain growth. Electron back-scatter diffraction (EBSD) has shown that the prevailing type of twins is {101}. Cyclic twins are common. High-angle annular dark-filed scanning transmission electron microscopy (HAADF-STEM) image analysis revealed non-uniform segregation of Nb along the twin boundaries, indicating that they are not directly triggered by Nb2O5, but are a result of yet unexplained sequence of topotaxial replacement reactions. Energy dispersive spectroscopy (EDS) has shown that by dual doping of SnO2 with CoO and Nb2O5 the amount of Co dissolved in SnO2 grains is always similar to 4x lower compared to the amount of incorporated Nb and propose the following mechanism of tin out-diffusion: 6 Sn(IV)(Sn(IV))(x) Sn(II)(Sn(IV))(") + Co(II)(Sn(IV))(") + 4 Nb(V)(Sn(IV))(.). Optimal electrical properties were achieved at 1 mol% Nb2O5 addition displaying high nonlinearity (alpha= 50), moderate break-down voltage (571 +/- 12 V/mm) and low leakage current (I-L = 4.2 mu A). The addition of 2 mol% of Nb2O5 has an inhibiting effect on densification and SnO2 grain growth, resulting in a collapse of nonlinearity and increase of leakage current.
机译:我们调查了SnO2压敏电阻陶瓷双掺杂的影响,用1mol%的CoO和不同量的Nb2O5(0.1-2mol%)对双界,微观结构发育和电性能的形成。 NB2O5加入致密化至更高的温度(高达1430℃),产生由孪晶的SnO2晶粒组成的微观结构。已经0.1摩尔%NB2O5通过扩散诱导的晶界移动(DIGM)触发了三倍的生长速率增加。达到0.5mol%的Nb2O5化学平衡,并且SnO2晶粒经过正常的晶粒生长。电子背散射衍射(EBSD)表明,普遍的双胞胎类型是{101}。循环双胞胎很常见。高角度环形暗型扫描透射透视电子显微镜(HAADF-Stem)图像分析显示了沿双界的非均匀偏析,表明它们不被Nb2O5直接触发,而是突出的未解释序列的结果替代反应。能量分散光谱(EDS)表明,通过COO和NB2O5双掺杂SnO 2和Nb2O5,与掺入的Nb的量相比,溶解在SnO 2晶粒中的CO的量始终与4x降低,并提出以下锡输出机制: 6SN(IV)(Sn(iv))(x)sn(ii)(sn(iv))(“)+ co(ii)(sn(iv))(”)+ 4 nb(v)(sn(sn( iv))(。)。在1mol%NB2O5加法下实现最佳电性能(Alpha = 50),中等分解电压(571 +/- 12 V / mm)和低漏电流(I-L =4.2μA)。添加2摩尔%的Nb2O5对致密化和SnO2晶粒生长产生抑制作用,导致非线性塌陷和漏电流的增加。

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