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Reactive ballistic deposition of α-Fe_2O_3 thin films for photoelectrochemical water oxidation

机译:α-Fe_2O_3薄膜的反应弹道沉积用于光电化学水氧化

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We report the preparation of α-Fe_2O_3 electrodes using a technique known as reactive ballistic deposition in which iron metal is evaporatively deposited in an oxygen ambient for photoelectrochemical (PEC) water oxidation. By manipulating synthesis parameters such as deposition angle, film thickness, and annealing temperature, we find that it is possible to optimize the structural and morphological properties of such films in order to improve their PEC efficiency. Incident photon to current conversion efficiencies (IPCE) are used to calculate an AM1.5 photocurrent of 0.55 mA/cm~2 for optimized films with an IPCE reaching 10% at 420 nm in 1 M KOH at +0.5 V versus Ag/AgCl. We also note that the commonly observed low photoactivity of extremely thin hematite films on fluorine-doped tin oxide substrates may be improved by modification of annealing conditions in some cases.
机译:我们报告了使用称为反应性弹道沉积的技术制备α-Fe_2O_3电极的方法,其中铁金属蒸发沉积在氧气环境中以进行光电化学(PEC)水氧化。通过操纵诸如沉积角,膜厚和退火温度等合成参数,我们发现可以优化此类膜的结构和形态特性,以提高其PEC效率。入射光子到电流转换效率(IPCE)用于计算优化膜的AM1.5光电流0.55 mA / cm〜2,相对于Ag / AgCl,IPCE在+0.5 V的1 M KOH中在420 nm处达到10%的IPCE。我们还注意到,在某些情况下,可以通过改变退火条件来改善掺氟氧化锡基板上极薄的赤铁矿薄膜的低光活性。

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