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Robust surface doping of Bi _2Se _3 by rubidium intercalation

机译:嵌入对Bi _2Se _3的稳健表面掺杂

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摘要

Rubidium adsorption on the surface of the topological insulator Bi _2Se _3 is found to induce a strong downward band bending, leading to the appearance of a quantum-confined two-dimensional electron gas state (2DEG) in the conduction band. The 2DEG shows a strong Rashba-type spin-orbit splitting, and it has previously been pointed out that this has relevance to nanoscale spintronics devices. The adsorption of Rb atoms, on the other hand, renders the surface very reactive, and exposure to oxygen leads to a rapid degrading of the 2DEG. We show that intercalating the Rb atoms, presumably into the van der Waals gaps in the quintuple layer structure of Bi _2Se _3, drastically reduces the surface reactivity while not affecting the promising electronic structure. The intercalation process is observed above room temperature and accelerated with increasing initial Rb coverage, an effect that is ascribed to the Coulomb interaction between the charged Rb ions. Coulomb repulsion is also thought to be responsible for a uniform distribution of Rb on the surface.
机译:发现原子吸附在拓扑绝缘体Bi _2Se _3的表面上会引起强烈的向下能带弯曲,从而导致在导带中出现量子限制的二维电子气态(2DEG)。 2DEG显示出很强的Rashba型自旋轨道分裂,并且先前已经指出,这与纳米级自旋电子器件有关。另一方面,Rb原子的吸附使表面具有很高的反应活性,而暴露于氧气会导致2DEG迅速降解。我们表明,将Rb原子插入Bi _2Se _3五层结构的范德华间隙中,可以显着降低表面反应性,同时又不影响有希望的电子结构。在室温以上观察到插层过程,并随着初始Rb覆盖率的增加而加速,该过程归因于带电Rb离子之间的库仑相互作用。库仑排斥也被认为是表面上Rb均匀分布的原因。

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