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Atomistic Boron-Doped Graphene Field-Effect Transistors: A Route toward Unipolar Characteristics

机译:原子掺杂硼的石墨烯场效应晶体管:通向单极特性的途径

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摘要

We report fully quantum simulations of realistic models of boron-doped graphene-based field-effect transistors, including atomistic details based on DFT calculations. We show that the self-consistent solution of the three-dimensional (3D) Poisson and Schrdinger equations with a representation in terms of a tight-binding Hamiltonian manages to accurately reproduce the DFT results for an isolated boron-doped graphene nanoribbon. Using a 3D Poisson/Schrdipger solver within the non-equilibrium Green's function (NEGF) formalism, self-consistent calculations of the gate-screened scattering potentials induced by the boron impurities have been performed, allowing the theoretical exploration of the tunability of transistor characteristics. The boron-doped graphene transistors are found to approach unipolar behavior as the boron concentration is increased and, by tuning the density of chemical dopants, the electronhole transport asymmetry can be finely adjusted. Correspondingly, the onset of a mobility gap in the device is observed. Although the computed asymmetries are not sufficient to warrant proper device operation, our results represent an initial step in the direction of improved transfer characteristic and, in particular, the developed simulation strategy is a powerful new tool for modeling doped graphene nanostructures.
机译:我们报告了基于硼掺杂的石墨烯的场效应晶体管的现实模型的完整量子模拟,包括基于DFT计算的原子细节。我们显示了三维(3D)Poisson和Schrdinger方程的自洽解,用紧密结合的哈密顿量表示,可以准确地重现隔离硼掺杂石墨烯纳米带的DFT结果。在非平衡格林函数(NEGF)形式中使用3D Poisson / Schrdipger求解器,对由硼杂质引起的栅屏蔽散射电位进行了自洽计算,从而可以从理论上探索晶体管特性的可调性。随着硼浓度的增加,发现掺硼的石墨烯晶体管接近单极性行为,并且通过调节化学掺杂剂的密度,可以精确地调节电子空穴传输的不对称性。相应地,观察到装置中迁移率间隙的开始。尽管计算出的不对称度不足以保证器件正常工作,但我们的结果代表了改善传输特性的第一步,特别是,开发的仿真策略是一种用于建模掺杂石墨烯纳米结构的强大新工具。

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