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Correlation between surface stress and apparent young's modulus of top-down silicon nanowires

机译:自顶向下的硅纳米线的表面应力与表观杨氏模量之间的相关性

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In this work, we report experimental evidence of surface stress effects on the mechanical properties of silicon nanostructures. As-fabricated, top-down silicon nanowires (SiNWs) are bent up without any applied force. This self-buckling is related to the surface relaxation that reaches an equilibrium with bulk deformation due to the material elasticity. We measure the SiNW self-deformation by atomic force microscopy (AFM), and we apply a simple physical model in order to give an estimation of the surface stress. If the equilibrium is altered by a nanoforce, applied by an AFM tip, nanowires find a new equilibrium condition bending down (mechanical bistability). In this work, for the first time, we report a clear and quantitative relationship between the SiNWs' apparent Young's modulus, measured by force-deflection spectroscopy, and the estimated value of surface stress, obtained by self-buckling measurements taking into account the Young's modulus of bulk silicon. This is an experimental confirmation that the surface stress is fundamental in determining mechanical properties of SiNWs, and that the elastic behavior of nanostructures strongly depends on their surfaces.
机译:在这项工作中,我们报告了表面应力对硅纳米结构力学性能影响的实验证据。加工后的自上而下的硅纳米线(SiNW)无需任何外力即可向上弯曲。这种自屈曲与表面松弛有关,该松弛在材料弹性的作用下与整体变形达到平衡。我们通过原子力显微镜(AFM)测量SiNW自变形,并应用简单的物理模型以估计表面应力。如果通过AFM尖端施加的纳米力改变平衡,则纳米线会发现弯曲的新平衡条件(机械双稳态)。在这项工作中,我们首次报告了通过力挠光谱法测量的SiNW的表观杨氏模量与考虑了杨氏模量的自屈曲测量获得的表面应力估计值之间的清晰定量关系。体硅模量。这是一个实验证实,表面应力是确定SiNWs力学性能的基础,并且纳米结构的弹性行为很大程度上取决于其表面。

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