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Growth mechanism and controlled synthesis of AB-stacked bilayer graphene on Cu-Ni alloy foils

机译:Cu-Ni合金箔上AB堆积双层石墨烯的生长机理和受控合成

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摘要

Strongly coupled bilayer graphene (i.e., AB stacked) grows particularly well on commercial "90-10" Cu-Ni alloy foil. However, the mechanism of growth of bilayer graphene on Cu-Ni alloy foils had not been discovered. Carbon isotope labeling (sequential dosing of CH _4~(12) and CH _4~(13)) and Raman spectroscopic mapping were used to study the growth process. It was learned that the mechanism of graphene growth on Cu-Ni alloy is by precipitation at the surface from carbon dissolved in the bulk of the alloy foil that diffuses to the surface. The growth parameters were varied to investigate their effect on graphene coverage and isotopic composition. It was found that higher temperature, longer exposure time, higher rate of bulk diffusion for ~(12)C vs ~(13)C, and slower cooling rate all produced higher graphene coverage on this type of Cu-Ni alloy foil. The isotopic composition of the graphene layer(s) could also be modified by adjusting the cooling rate. In addition, large-area, AB-stacked bilayer graphene transferrable onto Si/SiO _2 substrates was controllably synthesized.
机译:强耦合的双层石墨烯(即AB堆叠)在商用“ 90-10” Cu-Ni合金箔上的生长特别好。但是,尚未发现双层石墨烯在Cu-Ni合金箔上的生长机理。碳同位素标记(CH _4〜(12)和CH _4〜(13)的连续剂量)和拉曼光谱图研究了生长过程。据了解,石墨烯在Cu-Ni合金上生长的机理是通过溶解在合金箔主体中的碳扩散到表面而在表面上沉淀出来的。改变生长参数以研究其对石墨烯覆盖率和同位素组成的影响。已经发现,较高的温度,较长的暴露时间,〜(12)C与〜(13)C相比,较高的体积扩散速率和较慢的冷却速率都在此类Cu-Ni合金箔上产生了较高的石墨烯覆盖率。石墨烯层的同位素组成也可以通过调节冷却速率来改变。此外,可控制地合成了可转移到Si / SiO _2衬底上的大面积AB堆叠双层石墨烯。

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