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Nanopatterning of transition metal surfaces via electrochemical dimple array formation

机译:通过电化学凹坑阵列形成对过渡金属表面进行纳米构图

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摘要

Nanoscale surface patterning is of great importance for applications ranging from catalysts to biomaterials. We show the formation of ordered nanoscale dimple arrays on titanium, tungsten, and zirconium during electropolishing, demonstrating versatility of a process previously only reported for tantalum. This is a rare example of an electrochemical pattern formation process that can be translated to other materials. The dimpled surfaces have been characterized with scanning electron microscopy, transmission electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy, and electrochemical conditions were optimized for each material. While conditions for titanium and tungsten resemble those for tantalum, zirconium requires a different type of electrolyte. Given the appropriate electropolishing chemistry, formation of these patterns should be possible on any metal surface. The process is very robust on homogeneous surfaces, but sensitive to inhomogeneities in chemical composition, such as in the case of differentially etched alloys. An alternative process for some materials such as platinum is the coating of a dimpled substrate with a thin film of the required material.
机译:纳米级表面图案化对于从催化剂到生物材料的应用非常重要。我们显示了在电抛光过程中在钛,钨和锆上形成有序的纳米级酒窝阵列,证明了以前仅报道过钽工艺的多功能性。这是可转化为其他材料的电化学图案形成过程的罕见示例。凹坑的表面已经通过扫描电子显微镜,透射电子显微镜,原子力显微镜和X射线光电子能谱进行了表征,并且针对每种材料优化了电化学条件。虽然钛和钨的条件类似于钽的条件,但锆需要不同类型的电解质。在适当的电抛光化学作用下,在任何金属表面上都应该可以形成这些图案。该方法在均质表面上非常坚固,但对化学成分的不均匀性敏感,例如在差分蚀刻合金的情况下。对于某些材料(例如铂)的替代方法是在凹坑基板上涂覆所需材料的薄膜。

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