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首页> 外文期刊>ACS nano >Cerium Oxide Nanoclusters on Graphene/Ru (0001): Intercalation of Oxygen via Spillover
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Cerium Oxide Nanoclusters on Graphene/Ru (0001): Intercalation of Oxygen via Spillover

机译:石墨烯/钌上的氧化铈纳米簇(0001):通过溢出插入氧气

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Cerium oxide is an important catalytic material known for its ability to store and release oxygen, and as such, it has been used in a range of applications, both as an active catalyst and as a catalyst support. Using scanning tunneling microscopy and Auger electron spectroscopy, we investigated oxygen interactions with CeOx nanoclusters on a complete graphene monolayer-covered Ru(0001) surface at elevated temperatures (600-725 K). Under oxidizing conditions (P-O2 = 1 x 10(-7) Torr), oxygen intercalation under the graphene layer is observed. Time dependent studies demonstrate that the intercalation proceeds via spillover of oxygen from CeOx nanoclusters through the graphene (Gr) layer onto the Ru(0001) substrate and extends until the Gr layer is completely intercalated. Atomically resolved images further show that oxygen forms a p(2 x 1) structure underneath the Gr monolayer. Temperature dependent studies yield an apparent kinetic barrier for the intercalation of 1.21 eV. This value correlates well with the theoretically determined value for the reduction of small CeO2 clusters reported previously. At higher temperatures, the intercalation is followed by a slower etching of the intercalated graphene (apparent barrier of 1.60 eV). Vacuum annealing of the intercalated fir leads to the formation of carbon monoxide, causing etching of the graphene film, demonstrating that the spillover of oxygen is not reversible. In agreement with previous studies, no intercalation is observed on a complete graphene monolayer without CeOx clusters, even in the presence of a large number of point defects. These studies demonstrate that the easily reducible CeOx clusters act as intercalation gateways capable of efficiently delivering oxygen underneath the graphene layer.
机译:氧化铈是一种重要的催化材料,以其储存和释放氧气的能力而著称,因此,氧化铈已在多种应用中用作活性催化剂和催化剂载体。使用扫描隧道显微镜和俄歇电子能谱,我们研究了在高温(600-725 K)下,石墨烯单层覆盖的Ru(0001)表面上与CeOx纳米团簇之间的氧相互作用。在氧化条件下(P-O2 = 1 x 10(-7)Torr),观察到氧在石墨烯层下的嵌入。依赖时间的研究表明,嵌入过程是通过CeOx纳米团簇中的氧气通过石墨烯(Gr)层溢出到Ru(0001)衬底上而进行的,一直延伸到Gr层完全嵌入为止。原子分辨图像进一步表明,氧在Gr单层下形成p(2 x 1)结构。温度依赖性研究为插入1.21 eV产生了明显的动力学障碍。该值与先前报道的减少小型CeO2团簇的理论确定值具有很好的相关性。在较高的温度下,插层之后是对插层石墨烯的较慢蚀刻(1.66 eV的表观势垒)。插层杉木的真空退火导致一氧化碳的形成,引起石墨烯膜的蚀刻,表明氧气的溢出是不可逆的。与先前的研究一致,即使存在大量点缺陷,在没有CeOx簇的完整石墨烯单层上也未观察到嵌入。这些研究表明,易还原的CeOx团簇充当插层通道,能够有效地在石墨烯层下输送氧气。

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