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Two-terminal molecular memories from solution-deposited C_(60) films in vertical silicon nanogaps

机译:垂直硅纳米间隙中溶液沉积的C_(60)膜的两末端分子存储器

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摘要

We demonstrate here two-terminal, charge-based memory from C_(60) films inside vertical 7 nm silicon nanogap devices. This testbed structure eliminated the possibility of metal migration in the nanostructure because the two electrodes are made solely of silicon; hence, the often troublesome and confusing possibility of filamentary metal formation is obviated. Saturated solutions of C_(60) in toluene, mesitylene, and 1-methylnaphthalene were each used to deposit these films at elevated temperatures. Electrical I-V measurements reveal a high yield (67%) of devices demonstrating bipolar, switchable hysteresis from both the mesitylene- and 1-methylnaphthalene- deposited devices, while the toluene-grafted devices display no such behavior. Pulse-based memory measurements of switching devices indicate high ON/OFF ratios (maximum ~1500), good stability (>100 cycles without device degradation) for molecular devices, and low operating currents (~10~(-11) A) in room temperature testing.
机译:我们在这里展示了来自垂直7 nm硅纳米间隙器件内C_(60)膜的基于电荷的两端存储。该测试台结构消除了金属在纳米结构中迁移的可能性,因为两个电极仅由硅制成;因此,避免了通常会造成麻烦和混乱的丝状金属形成的可能性。 C_(60)在甲苯,均三甲苯和1-甲基萘中的饱和溶液分别用于在高温下沉积这些薄膜。 I-V电气测量表明,从均三甲苯和1-甲基萘沉积的器件中均显示出双极,可切换的滞后现象的器件的收率很高(67%),而甲苯接枝的器件则没有这种行为。开关设备的基于脉冲的内存测量结果表明,高开关率(最大〜1500),分子设备的良好稳定性(> 100个周期而不会导致设备退化)和室内低工作电流(〜10〜(-11)A)温度测试。

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