Roller-type nanoimprint lithography is a technique that can potentially increase the throughput of the imprinting process to levels competitive for low-cost, large-area, nanoscale manufacturing. A paper in this issue by Ahn and Guo presents a large-area roll-to-roll and roll-to-plate imprint process that builds on earlier work, increasing the substrate width to 4 in. and transferring patterns of 300 nm width and 600 nm pitch at a rate of 1 m/min.
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机译：辊式纳米压印光刻技术可以潜在地将压印过程的生产量提高到与低成本，大面积，纳米级制造具有竞争力的水平。安和郭（Ahn and Guo）在本期中发表的论文提出了一种大面积的卷对卷和卷对板压印工艺，该工艺建立在早期工作的基础上，将基板宽度增加到4英寸，并转印了300 nm宽度和600 nm的图案间距为1 m / min。
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