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Fabrication of the funnel-shaped three-dimensional plasmonic tip arrays by directional photofluidization lithography

机译:定向光流化光刻技术制造漏斗形三维等离子尖端阵列

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摘要

Plasmonics allow localization of an electromagnetic (EM) field into nanoscale "hotspots", a feature that is of technological significance due to potential applications related to spectroscopic sensing and nanofocusing. In relation to this, many researchers have sought to fabricate metallic nanostructures with sharp edges, as they provide much higher EM field enhancement compared with rounded structures. However, a fabrication method satisfying stringent requirements for the efficient EM field enhancement including three-dimensionality, vertical orientation, large-area fabrication, and tunability of structural features, which are of practical importance for efficient plasmonic light enhancement at hotspots, has yet to be achieved. Herein, we fabricate large-area, vertically aligned three-dimensional plasmonic tip (i.e., nanofunnel) arrays with unprecedented flexibility in the control of the structural features by directional photofluidization lithography. Using this approach, the structural features of nanofunnel tips including the sharpness, shape, and orientation were precisely controlled in a scalable and deterministic manner. The effects of the structural features of the nanofunnel on the EM field enhancement were systematically investigated and analyzed, and the optimum tip features for maximum EM field enhancement were thereupon identified. The suggested nanofabrication technique and resulting structures will be of practical importance in spectroscopic and nanophotonic applications.
机译:等离子技术可以将电磁场(EM)定位到纳米级“热点”,由于与光谱感应和纳米聚焦相关的潜在应用,该功能具有技术重要性。与此相关,许多研究人员试图制造具有锋利边缘的金属纳米结构,因为与圆形结构相比,它们提供了更高的电磁场增强。然而,满足对高效电磁场增强的严格要求的制造方法,包括三维,垂直取向,大面积制造和结构特征的可调谐性,这对于在热点处进行有效的等离激元光增强具有实际意义。实现。本文中,我们通过定向光流化光刻技术制造了具有空前灵活性的大面积,垂直对齐的三维等离激元尖端(即纳米漏斗)阵列。使用这种方法,以可扩展和确定的方式精确控制了纳米漏斗尖端的结构特征,包括清晰度,形状和方向。对纳米漏斗的结构特征对电磁场增强的影响进行了系统的研究和分析,从而确定了最大电磁场增强的最佳尖端特征。建议的纳米制造技术和所得结构在光谱和纳米光子应用中将具有实际重要性。

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