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首页> 外文期刊>ACS nano >Superconducting filaments formed during nonvolatile resistance switching in electrodeposited δ-bi_2o_3
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Superconducting filaments formed during nonvolatile resistance switching in electrodeposited δ-bi_2o_3

机译:电沉积δ-bi_2o_3中的非易失性电阻切换期间形成的超导细丝

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We show that electrodeposited films of δ-Bi_2O_3 in a Pt/δ-Bi_2O_3/Au cell exhibit unipolar resistance switching. After being formed at a large electric field of 40 MV/m, the cell can be reversibly switched between a low resistance state (156 Ω) and a high resistance state (1.2 GΩ) by simply cycling between SET and RESET voltages of the same polarity. Because the high and low resistance states are persistent, the cell is a candidate for nonvolatile resistance random access memory (RRAM). A Bi nanofilament forms at the SET voltage, and it ruptures to form a 50 nm gap during the RESET step at a current density of 2 × 10 ~7 A/cm~2. The diameter of the Bi filament is a function of the compliance current, and can be tuned from 140 to 260 nm, but the current density in the RESET step is independent of the Bi diameter. An electromigration rupture mechanism is proposed. The Bi nanofilaments in the low resistance state are superconducting, with a Tc of 5.8 K and an H_c of 5 kOe. This is an unexpected result, because bulk Bi is not a superconductor.
机译:我们表明,在Pt /δ-Bi_2O_3/ Au电池中δ-Bi_2O_3的电沉积膜表现出单极电阻切换。在40 MV / m的大电场下形成电池后,只需在相同极性的SET和RESET电压之间循环,即可在低电阻状态(156Ω)和高电阻状态(1.2GΩ)之间可逆切换。由于高电阻状态和低电阻状态是持久的,因此该单元是非易失性电阻随机存取存储器(RRAM)的候选对象。 Bi纳米丝在SET电压下形成,并且在RESET步骤期间以2×10〜7 A / cm〜2的电流密度破裂形成50 nm的间隙。 Bi灯丝的直径是顺从电流的函数,可以从140 nm调整到260 nm,但是RESET步骤中的电流密度与Bi直径无关。提出了一种电迁移破裂机制。低电阻状态的Bi纳米丝超导,Tc为5.8 K,H_c为5 kOe。这是出乎意料的结果,因为块Bi不是超导体。

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