Practical method to limit tip-sample contact stress and prevent wear in amplitude modulation atomic force microscopy

摘要

Amplitude modulation atomic force microscopy (AM-AFM) is one of the most popular AFM modes because of the reduced tip-sample interaction, compared to contact mode AFM, and the ability to acquire high-resolution images while interrogating the sample's material composition through phase imaging. Despite the reduced tip-sample interaction, tip and sample wear can occur through gradual atomic scale processes that can significantly accumulate due to the high frequency of the tip-sample interaction and through high intermittent contact stresses. Starting from existing analytical formulations, we introduce a method for selecting an appropriate probe and free oscillation amplitude that avoids exceeding a critical contact stress to minimize tip/sample damage. The approach is presented for the case of both a Hertzian-and a Derjaguin-Müller- Toporov-like tip-sample contact. Stress maps and related simplified formulas are provided that enable one to determine allowable free oscillation amplitudes to stay below a target contact stress for given cantilever and sample parameters (combined into a single "cantilever-sample constant" that we introduce). Experimental results show how sharp silicon tips, either uncoated or coated with diamond-like carbon and silicon nitride, interacting with a hard and wear-resistant sample (ultrananocrystalline diamond) can be preserved while attaining high-quality AM-AFM images by using our proposed scheme. We also show that using our analysis to select parameters that exceed the target contact stress indeed leads to significant tip wear. This method provides AM-AFM users with a better understanding of contact stresses and enables selection of AM-AFM cantilevers and experimental parameters that preserve the tip for long periods of use and prevents the sample from damage.