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首页> 外文期刊>ACS nano >Postgrowth Tuning of the Bandgap of Single-Layer Molybdenum Disulfide Films by Sulfur/Selenium Exchange
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Postgrowth Tuning of the Bandgap of Single-Layer Molybdenum Disulfide Films by Sulfur/Selenium Exchange

机译:硫/硒交换对单层二硫化钼薄膜带隙的生长后调节

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摘要

We demonstrate bandgap tuning of a single-layer MoS_2 film on SiO2/Si via substitution of its sulfur atoms by selenium through a process of gentle sputtering, exposure to a selenium precursor, and annealing. We characterize the substitution process both for S/S and S/Se replacement. Photoluminescence and, in the latter case, X-ray photoelectron spectroscopy provide direct evidence of optical band gap shift and selenium incorporation, respectively.We discussour experimental observations, including the limit of the achievable bandgap shift, in terms of the role of stress in the film as elucidated by computational studies, based on density functional theory. The resultant films are stable in vacuum, but deteriorate under optical excitation in air.
机译:我们展示了通过柔和溅射,暴露于硒前体和退火过程,通过硒取代其硫原子而在SiO2 / Si上单层MoS_2薄膜的带隙调谐。我们描述了S / S和S / Se替换的替代过程。光致发光和X射线光电子能谱分别提供了光学带隙位移和硒掺入的直接证据。我们讨论了我们的实验观察结果,包括可达到的带隙位移的极限,这取决于应力在硅中的作用。根据密度泛函理论通过计算研究阐明的胶片。所得膜在真空中稳定,但是在空气中的光激发下变质。

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