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首页> 外文期刊>ACS nano >Quasiparticle Scattering in the Rashba Semiconductor BiTeBr: The Roles of Spin and Defect Lattice Site
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Quasiparticle Scattering in the Rashba Semiconductor BiTeBr: The Roles of Spin and Defect Lattice Site

机译:Rashba半导体BiTeBr中的准粒子散射:自旋和缺陷晶格位点的作用

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摘要

Observations of quasiparticle interference have been used in recent years to examine exotic carrier behavior at the surfaces of emergent materials, connecting carrier dispersion and scattering dynamics to real-space features with atomic resolution. We observe quasiparticle interference in the strongly Rashba split 2DEG-like surface band found at the tellurium termination of BiTeBr and examine two mechanisms governing quasiparticle scattering: We confirm the suppression of spin-flip scattering by comparing measured quasiparticle interference with a spin dependent elastic scattering model applied to the calculated spectral function. We also use atomically resolved STM maps to identify point defect lattice sites and spectro-microscopy imaging to discern their varying scattering strengths, which we understand in terms of the calculated orbital characteristics of the surface band. Defects on the Bi subIattice" cause the strongest scattering of the predominantly Bi 6p derived surface band, with other defects causing nearly no scattering near the conduction band minimum.
机译:近年来,准粒子干扰的观察已用于检查新兴材料表面的奇异载流子行为,将载流子的色散和散射动力学与原子分辨率的真实空间特征联系起来。我们观察到在BiTeBr碲终止处发现的强Rashba分裂2DEG状表面带中的准粒子干扰,并检查了控制准粒子散射的两种机制:通过将测得的准粒子干扰与自旋相关的弹性散射模型进行比较,我们确认了对自旋翻转散射的抑制。应用于计算的光谱函数。我们还使用原子分辨的STM映射图来识别点缺陷晶格位点,并使用光谱显微镜成像来识别其变化的散射强度,我们根据计算出的表面带轨道特性了解了这一点。 “ Bi亚晶格上的缺陷”会导致主要由Bi 6p衍生的表面带的最大散射,而其他缺陷则导致在导带最小值附近几乎没有散射。

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