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Modulating Electrical Properties of InAs Nanowires via Molecular Monolayers

机译:通过分子单层调节InAs纳米线的电性能

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In recent years, InAs nanowires have been demonstrated with the excellent electron mobility as well as highly efficient near-infrared and visible photoresponse at room temperature. However, due to the presence of a large amount of surface states that originate from the unstable native oxide, the fabricated nanowire transistors are always operated in the depletion mode with degraded electron mobility, which is not energy-efficient. In this work, instead of the conventional inorganic sulfur or alkanethiol surface passivation, we employ aromatic thiolate (ArS-)-based molecular monolayers with controllable molecular design and electron density for the surface modification of InAs nanowires (i.e., device channels) by simple wet chemistry. More importantly, besides reliably improving the device performances by enhancing the electron mobility and the current on off ratio through surface state passivation, the device threshold voltage (V-Th) can also be modulated by varying the para-substituent of the monolayers such that the molecule bearing electron-withdrawing groups would significantly shift the V-Th towards the positive region for the enhancement mode device operation, in which the effect has been quantified by density functional theory calculations. These findings reveal explicitly the efficient modulation of the InAs nanowires' electronic transport properties via ArS--based molecular monolayers, which further elucidates the technological potency of this ArS- surface treatment for future nanoelectronic device fabrication and circuit integration.
机译:近年来,InAs纳米线已被证明具有出色的电子迁移率以及在室温下高效的近红外和可见光响应。然而,由于存在大量源自不稳定天然氧化物的表面状态,因此所制造的纳米线晶体管总是以耗尽模式操作,电子迁移率降低,这是不节能的。在这项工作中,代替常规的无机硫或链烷硫醇表面钝化,我们采用具有可控分子设计和电子密度的基于芳族硫醇盐(ArS-)的分子单分子层,通过简单的湿法对InAs纳米线(即器件通道)进行表面修饰化学。更重要的是,除了通过通过表面态钝化提高电子迁移率和电流通断比来可靠地改善器件性能外,还可以通过改变单层的对位取代基来调节器件阈值电压(V-Th)。带有吸电子基团的分子将使V-Th显着向正区移动,以进行增强模式器件操作,其中效应已通过密度泛函理论计算进行了量化。这些发现明确揭示了通过基于ArS的分子单层对InAs纳米线的电子传输特性的有效调节,这进一步阐明了该ArS表面处理的技术潜力,可用于未来的纳米电子器件制造和电路集成。

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