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WO3 Nanoflakes for Enhanced Photoelectrochemical Conversion

机译:WO3纳米片增强光电化学转化

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摘要

We developed a postgrowth modification method of two-dimensional WO3 nanoflakes by a simultaneous solution etching and reducing process in a weakly acidic condition. The obtained dual etched and reduced WO3 nanoflakes have a much rougher surface, in which oxygen vacancies are created during the simultaneous etching/reducing process for optimized photoelectrochemical performance. The obtained photoanodes show an enhanced photocurrent density of similar to 1.10 mA/cm(2) at 1.0 V vs Ag/AgCl (similar to 1.23 V vs reversible hydrogen electrode), compared to 0.62 mA/cm(2) of pristine WO3 nanoflakes. The electrochemical impedance spectroscopy measurement and the density functional theory calculation demonstrate that this improved performance of dual etched and reduced WO3 nanoflakes is attributed to the increase of charge carrier density as a result of the synergetic effect of etching and reducing.
机译:我们通过在弱酸性条件下同时进行溶液蚀刻和还原工艺,开发了二维WO3纳米薄片的生长后改性方法。所获得的经双蚀刻和还原的WO3纳米片的表面要粗糙得多,其中在同时进行的蚀刻/还原过程中会产生氧空位,以优化光电化学性能。与原始WO3纳米薄片的0.62 mA / cm(2)相比,在1.0 V对Ag / AgCl(类似于1.23 V对可逆氢电极)下,所获得的光阳极显示出增强的光电流密度,类似于1.10 mA / cm(2)。电化学阻抗谱测量和密度泛函理论计算表明,双蚀刻和还原的WO3纳米片的这种改进性能归因于蚀刻和还原的协同效应,电荷载流子密度的增加。

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