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首页> 外文期刊>ACS nano >Passivation of metal surface states: Microscopic origin for uniform monolayer graphene by low temperature chemical vapor deposition
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Passivation of metal surface states: Microscopic origin for uniform monolayer graphene by low temperature chemical vapor deposition

机译:金属表面态的钝化:通过低温化学气相沉积获得均匀单层石墨烯的微观起源

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摘要

Scanning tunneling microscopy (STM) and density functional theory (DFT) calculations were used to investigate the surface morphology and electronic structure of graphene synthesized on Cu by low temperature chemical vapor deposition (CVD). Periodic line patterns originating from the arrangements of carbon atoms on the Cu surface passivate the interaction between metal substrate and graphene, resulting in flawless inherent graphene band structure in pristine graphene/Cu. The effective elimination of metal surface states by the passivation is expected to contribute to the growth of monolayer graphene on Cu, which yields highly enhanced uniformity on the wafer scale, making progress toward the commercial application of graphene.
机译:利用扫描隧道显微镜(STM)和密度泛函理论(DFT)计算研究了铜在低温化学气相沉积(CVD)合成的石墨烯的表面形态和电子结构。源自铜表面上碳原子排列的周期线图钝化了金属基底与石墨烯之间的相互作用,从而在原始石墨烯/铜中形成了无缺陷的固有石墨烯能带结构。期望通过钝化有效地消除金属表面状态将有助于单层石墨烯在Cu上的生长,从而在晶片规模上产生高度增强的均匀性,从而朝着石墨烯的商业化应用发展。

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