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首页> 外文期刊>ACS nano >Tuning and Identification of Interband Transitions in Monolayer and Bilayer Molybdenum Disulfide Using Hydrostatic Pressure
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Tuning and Identification of Interband Transitions in Monolayer and Bilayer Molybdenum Disulfide Using Hydrostatic Pressure

机译:静水压力对单层和双层二硫化钼带间跃迁的调谐和鉴定

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摘要

Few-layer molybdenum disulfide (MoS_2) is advantageous for application in next-generation electronic and optoelectronic devices. For monolayer MoS_2, it has been established that both the conduction band minimum (CBM) and the valence band maximum ±VBM) occur at the K point in the Brillouin zone. For bilayer MoS_2, it is known that the VBM occurs at the Γ point. However, whether the K valley or the Λ valley forms the CBM and the energy difference between them remain disputable. Theoretical calculations have not provided a conclusive answer. In this paper, we demonstrate that a direct K-K to an indirect Λ-K interband transition in bilayer MoS_2 can be optically detected by tuning the hydrostatic pressure. A changeover of the CBM from the K valley to the Λ valley is observed to occur under a pressure of approximately 1.5 GPa. The experimental results clearly indicate that the K valley forms the CBM under zero strain, while the Λ valley is approximately 89 ± 9 meV higher in energy.
机译:很少层的二硫化钼(MoS_2)有利于应用于下一代电子和光电设备。对于单层MoS_2,已确定导带最小值(CBM)和价带最大值(VBM)都出现在布里渊区的K点。对于双层MoS_2,已知VBM发生在Γ点。但是,无论是K谷还是Λ谷构成了CBM,它们之间的能量差仍然存在争议。理论计算尚未提供结论性的答案。在本文中,我们证明可以通过调节静水压来光学检测双层MoS_2中从直接K-K到间接Λ-K带间跃迁。观察到在大约1.5 GPa的压力下,煤层气从K谷向Λ谷的转变。实验结果清楚地表明,K谷在零应变下形成了CBM,而Λ谷的能量大约高89±9 meV。

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