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Joint mapping of mobility and trap density in colloidal quantum dot solids

机译:胶体量子点固体中迁移率和陷阱密度的联合映射

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摘要

Field-effect transistors have been widely used to study electronic transport and doping in colloidal quantum dot solids to great effect. However, the full power of these devices to elucidate the electronic structure of materials has yet to be harnessed. Here, we deploy nanodielectric field-effect transistors to map the energy landscape within the band gap of a colloidal quantum dot solid. We exploit the self-limiting nature of the potentiostatic anodization growth mode to produce the thinnest usable gate dielectric, subject to our voltage breakdown requirements defined by the Fermi sweep range of interest. Lead sulfide colloidal quantum dots are applied as the active region and are treated with varying solvents and ligands. In an analysis complementary to the mobility trends commonly extracted from field-effect transistor studies, we focus instead on the subthreshold regime and map out the density of trap states in these nanocrystal films. The findings point to the importance of comprehensively mapping the electronic band- and gap-structure within real quantum solids, and they suggest a new focus in investigating quantum dot solids with an aim toward improving optoelectronic device performance.
机译:场效应晶体管已被广泛用于研究胶体量子点固体中的电子传输和掺杂,从而产生了巨大的效果。但是,这些设备用于阐明材料的电子结构的全部功能尚未得到利用。在这里,我们部署了纳米电介质场效应晶体管,以绘制胶体量子点固体带隙内的能量分布图。我们利用恒电位阳极氧化生长模式的自限性特性来生产最薄的可用栅极电介质,这取决于我们感兴趣的费米扫描范围所定义的电压击穿要求。硫化铅胶体量子点被用作活性区域,并用各种溶剂和配体进行处理。在对通常从场效应晶体管研究中提取的迁移率趋势进行补充的分析中,我们将重点放在亚阈值范围内,并绘制出这些纳米晶体膜中陷阱能级的密度。这些发现指出了在真实的量子固体中全面绘制电子能带结构和间隙结构的重要性,并提出了研究量子点固体的新重点,旨在改善光电器件的性能。

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