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Multiobjective Optimization of Design of 4H-SiC Power MOSFETs for Specific Applications

机译:特定应用4H-SIC电源MOSFET设计的多目标优化

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摘要

The electrical characteristics of a 4H silicon carbide (4H-SiC) metal-oxide-semiconductor field-effect transistor (MOSFET) have been investigated by using a multiobjective genetic algorithm (MOGA) to overcome the existing tradeoff between main device figures of merit such as the breakdown voltage, drain current, and ON-state resistance. The aim of this work is to achieve an optimized device for a specific application. In particular, without loss of generality, we refer to a dual-implanted MOSFET (DMOSFET) dimensioned for use as a low-power transistor in direct current (DC)-DC converters for solar power optimizers. Typical blocking voltages for these transistors are around 150V. In this investigation, both analytical and numerical models are used as objective functions in MOGA to determine a set of optimized physical and geometrical device parameters that meet the application constraints while minimizing the ON-state resistance (R-ON). The optimized DMOSFET exhibits an R-ON value of a few hundred kxm(2) for different breakdown voltages in the range from 150V to 800V.
机译:通过使用多目标遗传算法(MOGA)研究了4H碳化硅(4H-SIC)金属氧化物 - 氧化物半导体场效应晶体管(MOSFET)的电特性,以克服主设备与诸如的优点之间的现有权衡击穿电压,漏极电流和导通电阻。这项工作的目的是为特定应用程序实现优化的设备。特别地,在没有损失的情况下,我们指的是双植入的MOSFET(DMOSFET),其尺寸为用于太阳能优化器的直流(DC)-DC转换器中的低功率晶体管。这些晶体管的典型阻挡电压约为150V。在本研究中,分析和数值模型都用作MOGA的客观函数,以确定一组符合应用限制的一组优化的物理和几何设备参数,同时最小化导通状态电阻(R-on)。优化的DMOSFET显示出几百KXM(2)的R-ON值,对于150V至800V的不同击穿电压。

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