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Visualization and automatic detection of defect distribution in GaN atomic structure from sampling Moire phase

机译:从采样莫尔阶段的GaN原子结构缺陷分布的可视化和自动检测

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摘要

Quantitative detection of defects in atomic structures is of great significance to evaluating product quality and exploring quality improvement process. In this study, a Fourier transform filtered sampling Moire technique was proposed to visualize and detect defects in atomic arrays in a large field of view. Defect distributions, defect numbers and defect densities could be visually and quantitatively determined from a single atomic structure image at low cost. The effectiveness of the proposed technique was verified from numerical simulations. As an application, the dislocation distributions in a GaN/AlGaN atomic structure in two directions were magnified and displayed in Moire phase maps, and defect locations and densities were detected automatically. The proposed technique is able to provide valuable references to material scientists and engineers by checking the effect of various treatments for defect reduction.
机译:原子结构中的缺陷的定量检测对于评估产品质量和探索质量改进过程具有重要意义。 在该研究中,提出了一种傅里叶变换过滤的采样莫尔技术,以在大视野中可视化和检测原子阵列中的缺陷。 可以在低成本的单个原子结构图像视觉上和定量地确定缺陷分布,缺陷数字和缺陷密度。 从数值模拟中验证了所提出的技术的有效性。 作为应用,在两个方向上的GaN / AlGaN原子结构中的位错分布被放大并在莫尔相位映射中显示,并且自动检测缺陷位置和密度。 所提出的技术能够通过检查各种治疗对缺陷减少的效果来提供对材料科学家和工程师的有价值的参考。

著录项

  • 来源
    《Nanotechnology》 |2017年第45期|共7页
  • 作者单位

    Natl Inst Adv Ind Sci &

    Technol Res Inst Measurement &

    Analyt Instrumentat 1-1-1 Umezono Tsukuba Ibaraki 3058568 Japan;

    Natl Inst Adv Ind Sci &

    Technol Res Inst Measurement &

    Analyt Instrumentat 1-1-1 Umezono Tsukuba Ibaraki 3058568 Japan;

    Natl Inst Adv Ind Sci &

    Technol Res Inst Measurement &

    Analyt Instrumentat 1-1-1 Umezono Tsukuba Ibaraki 3058568 Japan;

    Toshiba Elect Devices &

    Storage Corp Discrete Semicond Div Adv Discrete Dev Ctr 1-1 Iwauchi Machi Nomi Ishikawa 9231293 Japan;

    Toshiba Elect Devices &

    Storage Corp Discrete Semicond Div Adv Discrete Dev Ctr 1-1 Iwauchi Machi Nomi Ishikawa 9231293 Japan;

    Toshiba Elect Devices &

    Storage Corp Discrete Semicond Div Adv Discrete Dev Ctr 1-1 Iwauchi Machi Nomi Ishikawa 9231293 Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    defect density; dislocation distribution; Fourier transform; sampling Moire; phase analysis;

    机译:缺陷密度;位错分布;傅里叶变换;采样莫尔;相分析;

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