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机译:SiGe层厚度对井组织SiGE / SiO2多层结构和光学性能的影响
Univ Minho CMEMS Campus Azurem P-4804533 Guimaraes Portugal;
CSIC Inst Opt Laser Proc Grp C Serrano 121 E-28006 Madrid Spain;
Univ Minho Phys Ctr Campus Gualtar P-4710057 Braga Portugal;
CNR IMM Sez Bologna Via P Gobetti 101 I-40129 Bologna Italy;
Univ Aveiro I3N Phys Dept Campus Univ Santiago P-3810193 Aveiro Portugal;
Univ Aveiro I3N Phys Dept Campus Univ Santiago P-3810193 Aveiro Portugal;
Univ Lisbon Inst Plasmas &
Nucl Fus Higher Tech Inst Av Rovisco Pais P-1049001 Lisbon Portugal;
Univ Lisbon Inst Plasmas &
Nucl Fus Higher Tech Inst Av Rovisco Pais P-1049001 Lisbon Portugal;
Abdelmalek Essaadi Univ FST Tanger Tangier 90000 Morocco;
Johannes Kepler Univ Linz Inst Semicond &
Solid State Phys Altenbergerstr 69 A-4040 Linz Austria;
CSIC Inst Opt Laser Proc Grp C Serrano 121 E-28006 Madrid Spain;
Univ Minho Phys Ctr Campus Gualtar P-4710057 Braga Portugal;
SiGe nanocrystals; multilayer structure; RF magnetron sputtering; TEM; photoluminescence; spectroscopic ellipsometry; Raman spectroscopy;
机译:SiGe层厚度对井组织SiGE / SiO2多层结构和光学性能的影响
机译:渗流对MIC处理的SiGe / Al多层膜结构和电性能的影响
机译:金属诱导结晶过程中SiGe / Al多层系统的结构和热电性质
机译:多孔SiGe / Si多层膜的结构和光学性质
机译:用于光通信变送器的SiGe BICMOS集成电路=光学通信变送器的SiGe BICMOS集成电路
机译:飞秒激发下纳米晶Si / SiO2多层膜的可调非线性光学性质
机译:金属诱导结晶过程中siGe al多层体系的结构和热电性质