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Solution-processed, hybrid 2D/3D MoS2/Si heterostructures with superior junction characteristics

机译:解决方案处理,混合2D / 3D MOS2 / SI异质结构,具有优异的结特性

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摘要

We report a theoretical and experimental investigation of the hybrid heterostructure interfaces between atomically thin MoS2 nanocrystals (NCs) on Si platform for their potential applications towards next-generation electrical and optical devices. Mie theory-based numerical analysis and COMSOL simulations based on the finite element method have been utilized to study the optical absorption characteristics and light-matter interactions in variable-sized MoS2 NCs. The size-dependent absorption characteristics and the enhancement of electric field of the heterojunction in the UV-visible spectral range agree well with the experimental results. A lithography-free, wafer-scale, 2D material on a 3D substrate hybrid vertical heterostructure has been fabricated using colloidal n-MoS2 NCs on p-Si. The fabricated p-n heterojunction exhibited excellent junction characteristics with a high rectification ratio suitable for voltage clipper and rectifier applications. The current-voltage characteristics of the devices under illumination have been performed in the temperature range of 10-300 K. The device exhibits a high photo-to-dark current ratio of similar to 3 x 10(3) and a responsivity comparable to a commercial Si photodetector. The excellent heterojunction characteristics demonstrate the great potential of MoS2 NC-based hybrid electronic and optoelectronic devices in the near future.
机译:我们在Si平台上报告了对原子薄MOS2纳米晶体(NCS)的混合异性结构界面的理论和实验研究,以实现其朝向下一代电气和光学装置的潜在应用。基于有限元方法的基于理论的数值分析和COMSOL模拟已经利用了在可变尺寸MOS2 NC中的光学吸收特性和浅品相互作用。 uV可见光谱系数中异质结的尺寸依赖性吸收特性和电场的增强与实验结果很好。在3D基板混合垂直异质结构上使用胶体N-MOS2 NCS制造了一种无光刻,晶片级,2D材料,在P-Si上制造。制造的P-N异质结具有适合于电压夹和整流器应用的高整流比的优异结特性。在10-300k的温度范围内进行了照明下的器件的电流 - 电压特性。该器件表现出类似于3×10(3)的高光到暗电流比和与a相当的响应率。商业SI光电探测器。优异的异质结特性在不久的将来展示了MOS2基于混合电子和光电器件的巨大潜力。

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