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Quantum transport localization through graphene

机译:通过石墨烯量化定位

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Localization of atomic defect-induced electronic transport through a single graphene layer is calculated using a full-valence electronic structure description as a function of the defect density and taking into account the atomic-scale deformations of the layer. The elementary electronic destructive interferences leading to Anderson localization are analyzed. The low-voltage current intensity decreases with increasing length and defect density, with a calculated localization length zeta = 3.5 nm for a defect density of 5%. The difference from the experimental defect density of 0.5% required for an oxide surface-supported graphene to obtain the same. is discussed, pointing out how interactions of the graphene supporting surface and surface chemical modifications also control electronic transport localization.
机译:使用单个石墨烯层的原子缺陷诱导的电子传输的定位是使用全价电子结构描述计算作为缺陷密度的函数,并考虑到层的原子尺度变形。 分析了导致安德森定位的基本电子破坏性干扰。 低压电流强度随着长度和缺陷密度的增加而降低,具有计算的本地化长度Zeta = 3.5nm,缺陷密度为5%。 与氧化物表面负载的石墨烯所需的实验缺陷密度为0.5%的差异以获得相同的差异。 讨论,指出石墨烯支撑表面和表面化学修改的相互作用也控制电子传输定位。

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