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Template-assisted electrodeposition of Ni and Ni/Au nanowires on planar and curved substrates

机译:平面和弯曲基板上Ni和Ni / Au纳米线的模板辅助电沉积

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摘要

We present a variant of the template-assisted electrodeposition method that enables the synthesis of large arrays of nanowires (NWs) on flat and curved substrates. This method uses ultra-thin (50 nm-10 mu m) anodic aluminum oxide membranes as a template. We have developed a procedure that uses a two-polymer protective layer to transfer these templates onto almost any surface. We have applied this technique to the fabrication of large arrays of Ni and segmented composition Ni/Au NWs on silicon wafers, Cu tapes, and thin (0.2 mm) Cu wires. In all cases, a complete coverage with NWs is achieved. The magnetic properties of these samples show an accentuated in-plane anisotropy which is affected by the form of the substrate (flat or curve) and the length of the NWs. Unlike current lithography techniques, the fabrication method proposed here allows the integration of complex nanostructures into devices, which can be fabricated on unconventional surfaces.
机译:我们介绍了模板辅助电沉积方法的变型,其能够在平坦和弯曲的基板上合成大纳米线(NWS)阵列。 该方法使用超薄(50nm-10μm)阳极氧化铝膜作为模板。 我们开发了一种使用双聚合物保护层的程序,将这些模板转移到几乎任何表面上。 我们已经将该技术应用于在硅晶片,Cu胶带和薄(0.2mm)Cu线上的大阵列和分段组合物Ni / Au NWS的大阵列。 在所有情况下,实现了与NWS完全覆盖。 这些样品的磁性特性显示出受面内各向异性的突出内各向异性,其受基板(平坦或曲线)的形式和NWS的长度影响。 与电流光刻技术不同,这里提出的制造方法允许将复合纳米结构的整合到装置中,这可以在非常规表面上制造。

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