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Accurate identification of layer number for few-layer WS2 and WSe2 via spectroscopic study

机译:通过光谱研究精确地识别几层WS2和WSE2的层数

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摘要

Transition metal dichalcogenides (TMDs) with a typical layered structure are highly sensitive to their layer number in optical and electronic properties. Seeking a simple and effective method for layer number identification is very important to low-dimensional TMD samples. Herein, a rapid and accurate layer number identification of few-layer WS2 and WSe2 is proposed via locking their photoluminescence (PL) peak-positions. As the layer number of WS2/WSe2 increases, it is found that indirect transition emission is more thickness-sensitive than direct transition emission, and the PL peak-position differences between the indirect and direct transitions can be regarded as fingerprints to identify their layer number. Theoretical calculation confirms that the notable thickness-sensitivity of indirect transition derives from the variations of electron density of states of W atom d-orbitals and chalcogen atom p-orbitals. Besides, the PL peak-position differences between the indirect and direct transitions are almost independent of different insulating substrates. This work not only proposes a new method for layer number identification via PL studies, but also provides a valuable insight into the thickness-dependent optical and electronic properties of W-based TMDs.
机译:具有典型分层结构的过渡金属二甲基甲基化物(TMDS)对光学和电子性质的层数非常敏感。寻求一个简单且有效的层数识别方法对低维TMD样品非常重要。这里,通过锁定它们的光致发光(PL)峰值位置,提出了几层WS2和WSE2的快速和准确的层数识别。作为WS2 / WSE2增加层数,可以发现,间接跃迁发射比直接跃迁发射更多厚度敏感,和间接和直接转变之间的PL峰位置的差异可被视为指纹来识别它们的层号码。理论计算证实,间接转变的显着厚度敏感性来自W原子D-轨道和硫族原子原子P-轨道的电子密度的变化。此外,间接和直接过渡之间的PL峰值位置差异几乎无关地与不同的绝缘基板无关。这项工作不仅提出了一种通过PL研究的层数识别的新方法,而且还提供了对基于W基TMD的厚度依赖性光学和电子性质的有价值的洞察。

著录项

  • 来源
    《Nanotechnology》 |2018年第12期|共8页
  • 作者单位

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

    Northeast Normal Univ Minist Educ Ctr Adv Optoelect Funct Mat Res Changchun 130024 Jilin Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    photoluminescence; WS2; WSe2; layer number identification; density functional theory; insulating substrates;

    机译:光致发光;WS2;WSE2;层数识别;密度泛函理论;绝缘基板;

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