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Temperature effects in contacts between a metal and a semiconductor nanowire near the degenerate doping

机译:在退化掺杂附近的金属和半导体纳米线之间的接触中的温度效应

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We have investigated the nonlinear conductance in diffusion-doped Si: GaAs nanowires contacted by patterned metal films in a wide range of temperatures T. The wire resistance R-W and the zero bias resistance R-C, dominated by the contacts, exhibit very different responses to temperature changes. While R-W shows almost no dependence on T, R-C varies by several orders of magnitude as the devices are cooled from room temperature to T = 5 K. We develop a model that employs a sharp donor level very low in the GaAs conduction band and show that our observations are consistent with the model predictions. We then demonstrate that such measurements can be used to estimate carrier properties in nanostructured semiconductors and obtain an estimate for N-D, the doping density in our samples. We also discuss the effects of surface states and dielectric confinement on carrier density in semiconductor nanowires.
机译:我们研究了扩散掺杂Si的非线性电导:通过图案化的金属膜在宽范围的温度下接触GaAs纳米线。导线电阻Rw和零偏置电阻Rc,由触点为主导,表现出对温度变化的非常不同的反应 。 虽然RW几乎没有对T的依赖性显示,但RC随着器件从室温冷却到T = 5 K而变化了几个数量级。我们开发了一种在GAAS传导频段中使用尖锐的供体水平的模型,并显示 我们的观察结果与模型预测一致。 然后,我们证明这种测量可用于估计纳米结构半导体中的载流子特性,并获得用于N-D的估计,样品中的掺杂密度。 我们还讨论了表面状态和介电限制对半导体纳米线中载流子密度的影响。

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