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Matrix-material dependence on the elongation of embedded gold nanoparticles induced by 4 MeV C-60 and 200 MeV Xe ion irradiation

机译:基质 - 材料依赖于4meV C-60和200mev Xe离子照射诱导的嵌入金纳米粒子的伸长率

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摘要

We report the elongation of embedded Au nanoparticles (NPs) in three different matrices, i.e. amorphous carbon (a-C), crystalline indium tin oxide (InxSn1-xOz; ITO) and crystalline calcium fluoride (CaF2), under irradiations of 4 MeV C-60(+) cluster ions and 200 MeV Xe14+ ions. Under 4 MeV C-60 cluster irradiation, strong sputtering is induced in CaF2 layer so that the whole the layer was completely lost at a fluence of 5 x 10(13) ions cm(-2). Au NPs were partly observed in the SiO2, probably due to the recoil implantation. Amorphous carbon (a-C) layer exhibits low sputtering loss even under 4 MeV C-60 irradiation. However, the elongation in a-C layer was low. While the ITO layer showed a certain decrease in thickness under 4 MeV C-60 irradiation, large elongation of Au NPs was observed under both 4 MeV C-60 and 200 MeV Xe irradiation. The ITO layer preserved the crystallinity even after large elongation was induced. This is the first report of the elongation of metal NPs in a crystalline matrix.
机译:我们报告嵌入的Au纳米颗粒(NP)的在三个不同的矩阵的伸长率,即无定形碳(AC),结晶氧化铟锡(InxSn1-XOZ; ITO)和氟化结晶钙(CaF 2),下的4兆电子伏C-60照射(+)簇离子和200 meV XE14 +离子。在4meV C-60簇照射下,在CAF2层中诱导强溅射,使整个层完全损失在5×10(13)离子Cm(-2)的流量。在SiO 2中部分观察到Au nps,可能是由于反冲植入。非晶碳(A-C)层即使在4mEV C-60照射下也表现出低溅射损失。然而,A-C层的伸长率低。虽然ITO层下显示出4兆电子伏C-60照射在厚度一定的减小,被两个4兆电子伏C-60和200兆电子伏的Xe照射下观察到的金纳米粒子的大伸长率。即使在诱导大伸长率之后,ITO层也保留了结晶度。这是晶体基质中金属NP伸长的第一报告。

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