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首页> 外文期刊>Nanotechnology >Defect influence on in-plane photocurrent of InAs/InGaAs quantum dot array: long-term electron trapping and Coulomb screening
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Defect influence on in-plane photocurrent of InAs/InGaAs quantum dot array: long-term electron trapping and Coulomb screening

机译:INAS / Ingaas Quantum Dot阵列内平面光电流的缺陷影响:长期电子捕获和库仑筛选

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Metamorphic InAs/In0.15Ga0.85 As and InAs/In0.31Ga0.69 As quantum dot (QD) arrays are known to be photosensitive in the telecommunication ranges at 1.3 and 1.55 mu m, respectively; however, for photonic applications of these nanostructures, the effect of levels related to defects still needs in-depth investigation. We have focused on the influence of electron traps of defects on photocurrent (PC) in the plane of the QD array, studying by PC and deep level thermally stimulated current spectroscopy together with HRTEM and theoretical modeling. In the structures, a rich spectrum of electron trap levels of point defects EL6 (E-c - 0.37 eV), EL7 (0.29-0.30 eV), EL8 (0.27 eV), EL9/M2 (0.22-0.23 eV), EL10/M1 (0.16 eV), M0 (similar to 0.11 eV) and three extended defects ED1/EL3 (0.52-0.54), ED2/EL4 (0.47-0.48 eV), ED3/EL5 (0.42-0.43 eV) has been identified. Among them, new defect levels undiscovered earlier in InAs/InGaAs nanostructures has been detected, in particular, EL8 and M0. The found electron traps are shown to affect a time-dependent PC at low temperatures. Besides a long-term kinetics due to trap charging, a prolonged PC decrement versus time is measured under constant illumination. The decrement is interpreted to be related to a Coulomb screening of the conductivity channel by the electrons captured in the QD interface traps. The decrement is well fitted by allometric exponents, which means many types of traps involved in electron capturing. This study provides new findings into the mechanism of in-plane PC of QD arrays, showing a crucial importance of growth-related defects on photoresponsivity at low temperatures.
机译:Metalymorphic Inas / In0.15Ga0.85 AS和InAs / In0.31Ga0.69,因为量子点(QD)阵列被称为在电信范围内分别在1.3和1.55亩的电信范围内光敏;然而,对于这些纳米结构的光子应用,与缺陷相关的水平效果仍需要深入调查。我们把重点放在缺陷电子陷阱的光电流(PC)上的量子点阵列的平面的影响,通过PC和深层次的研究与热高分辨和理论模型一起刺激电流谱。在结构中,丰富的电子捕集水平的点缺陷EL6(EC - 0.37eV),EL7(0.29-0.30eV),EL8(0.27eV),EL9 / M2(0.22-0.23eV),EL10 / M1( 0.16eV),M0(类似于0.11eV)和三种延长缺陷ED1 / EL3(0.52-0.54),ED2 / EL4(0.47-0.48eV),ED3 / EL5(0.42-0.43eV)。其中,已经检测到INAS / Ingaas纳米结构之前未发现的新缺陷水平,特别是EL8和M0。显示的电子疏水膜显示为在低温下影响时间依赖的PC。除了由于陷阱充电引起的长期动力学之外,在恒定的照明下测量延长的PC衰落与时间。将递减解释为与在QD接口陷阱中捕获的电子的电导信道的库仑筛选有关。减量通过各种指数齐全,这意味着电子捕获中所涉及的许多类型的陷阱。本研究为QD阵列的平面内PC机制提供了新发现,表明在低温下对光反对子有关的缺陷至关重要。

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