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Investigating influence of the magnetic arc blow in multi-break vacuum circuit breakers

机译:调查多断路器真空断路器中的电弧吹的影响

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This paper investigates the influence of the interactive magnetic field in multi-break vacuum circuit breakers (VCBs) on the arc plasma and the post-arc characteristics. The magnetic field of multi-break VCBs is asymmetric and off-center because of the interactive magnetic field, which is also called bias magnetic field (BMF). The BMF distribution of double-break VCBs is gained by electromagnetic analysis. The test circuit of the magnetic arc blow in multi-break VCBs is established by simplifying as the interaction between the vacuum arc and the BMF. The influence of the magnetic arc blow on the arc plasma is studied by the high-speed CMOS camera and the post-arc current measure. While the vacuum arc is in the direction of the Ampere force with the BMF at 200 mT, it is in the retrograde direction when the BMF is below 100mT, which results in the post-arc charge obviously varying from 9 mu C to 50 mu C. The relationship between the BMF and the post arc charge is gained. The mechanism of the magnetic arc blow in multi-break VCBs is discussed. Therefore, this paper can provide the base of construct and configuration to avoid the influence of the magnetic arc blow. Published by AIP Publishing.
机译:本文研究了多断路器真空断路器(VCB)中的交互式磁场对电弧等离子体和电弧后特性的影响。由于交互式磁场(也称为偏置磁场(BMF)),多次断裂VCB的磁场是不对称且偏心的。通过电磁分析获得了双断裂VCB的BMF分布。通过简化为真空电弧与BMF之间的相互作用,建立了多断路器VCB中的电弧放电测试电路。通过高速CMOS相机和电弧后电流测量研究了电弧吹对电弧等离子体的影响。当BMF为200 mT时,真空电弧沿安培力方向,而当BMF低于100mT时,则为逆行方向,这导致电弧后电荷明显在9μC至50μC之间变化。获得了BMF和电弧后电荷之间的关系。讨论了多断路器VCB中的电弧吹动机理。因此,本文可为避免电弧冲击的影响提供结构和构造依据。由AIP Publishing发布。

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