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Influence of pretreatment conditions of Ti film on field emission properties of carbon nanotubes films

机译:Ti膜的预处理条件对碳纳米管膜场发射性能的影响

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Carbon nanotubes (CNTs) films have been synthesized from methane and hydrogen gas mixture by microwave plasma chemical vapor deposition (MPCVD) on Ti-coated Al_2O_3 substrates, which mechanically grinded by SiO_2 powder with Fe dopant. It is found that the grindness is a crucial effect to produce CNTs. By varying pretreatment conditions of the substrates such as no grinding, grinding and grinded acidly washing, the grinding and acidly washing can lower the turn-on field and improve the emission current density and emission light dots. The current density of the un-pretreated sample attains 0.015 mA/cm~2, but the grinding sample and grinded acidly washing sample attain 12.6 and 3.8 mA/cm~2, at the electric field of 3.7 v/μm, respectively. The grinding sample shows the excellent field emission properties.
机译:碳纳米管(CNTs)薄膜是由甲烷和氢气混合物通过微波等离子体化学气相沉积(MPCVD)在涂有Ti的Al_2O_3基底上合成的,该基底通过SiO_2粉末与铁掺杂剂机械研磨。发现研磨是生产CNT的关键作用。通过改变基板的预处理条件,例如不进行研磨,研磨和酸洗,研磨和酸洗可以降低导通场并改善发射电流密度和发射光点。未经预处理的样品的电流密度达到0.015 mA / cm〜2,但是在3.7 v /μm的电场下,研磨样品和经酸洗的样品分别达到12.6和3.8 mA / cm〜2。研磨样品显示出极好的场发射特性。

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