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Investigation of hexagonal boron nitride as an atomically thin corrosion passivation coating in aqueous solution

机译:六方氮化硼水溶液中原子薄腐蚀钝化涂层的研究

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摘要

Hexagonal boron nitride (h-BN) atomic layers were utilized as a passivation coating in this study. A large-area continuous h-BN thin film was grown on nickel foil using a chemical vapor deposition method and then transferred onto sputtered copper as a corrosion passivation coating. The corrosion passivation performance in a Na2SO4 solution of bare and coated copper was investigated by electrochemical methods including cyclic voltammetry (CV), Tafel polarization and electrochemical impedance spectroscopy (EIS). CV and Tafel analysis indicate that the h-BN coating could effectively suppress the anodic dissolution of copper. The EIS fitting result suggests that defects are the dominant leakage source on h-BN films, and improved anti-corrosion performances could be achieved by further passivating these defects.
机译:六方氮化硼(h-BN)原子层在本研究中用作钝化涂层。使用化学气相沉积法在镍箔上生长大面积连续h-BN薄膜,然后将其转移到溅射铜上作为腐蚀钝化涂层。通过电化学方法,包括循环伏安法(CV),Tafel极化法和电化学阻抗谱(EIS),研究了裸铜和涂层铜在Na2SO4溶液中的腐蚀钝化性能。 CV和Tafel分析表明,h-BN涂层可以有效抑制铜的阳极溶解。 EIS拟合结果表明,缺陷是h-BN膜上的主要泄漏源,并且可以通过进一步钝化这些缺陷来提高防腐性能。

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