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Evaluation of a ferroelectric tunnel junction by ultraviolet-visible absorption using a removable liquid electrode

机译:使用可移动液体电极通过紫外-可见吸收评估铁电隧道结

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摘要

Ferroelectric memristors offer a significant alternative to their redox-based analogs in resistive random access memory because a ferroelectric tunnel junction (FTJ) exhibits a memristive effect that induces resistive switching (RS) regardless of the operating current level. This RS results from a change in the ferroelectric polarization direction, allowing the FTJ to overcome the restriction encountered in redox-based memristors. Herein, the memristive effect of an FTJ was investigated by ultraviolet-visible (UV-Vis) absorption spectroscopy using a removable mercury (Hg) top electrode (TE), BaTiO3 (BTO) ferroelectric tunnel layer, La0.7Sr0.3MnO3 (LSMO) semiconductor bottom electrode, and wide-bandgap quartz (100) single-crystal substrate to determine the low-resistance state (LRS) and high-resistance state (HRS) of the FTJ. A BTO (110)/LSMO (110) polycrystal memristor involving a Hg TE showed a small memristive effect (switching ratio). This effect decreased with increasing read voltage because of a small potential barrier height. The LRS and HRS of the FTJ showed quasi-similar UV-Vis absorption spectra, consistent with the small energy difference between the valence-band maximum of BTO and Fermi level of LSMO near the interface between the LRS and HRS. This energy difference stemmed from the ferroelectric polarization and charge-screening effect of LSMO based on an electrostatic model of the FTJ.
机译:铁电忆阻器在电阻式随机存取存储器中提供了其基于氧化还原的类似物的重要替代方案,因为铁电隧道结(FTJ)表现出忆阻效应,无论工作电流水平如何,都会引起电阻式开关(RS)。该RS是由铁电极化方向的变化引起的,从而使FTJ可以克服基于氧化还原的忆阻器中遇到的限制。在这里,FTJ的忆阻作用是通过使用可移除汞(Hg)顶部电极(TE),BaTiO3(BTO)铁电隧道层,La0.7Sr0.3MnO3(LSMO)的紫外可见(UV-Vis)吸收光谱研究的半导体底部电极和宽带隙石英(100)单晶衬底,以确定FTJ的低电阻状态(LRS)和高电阻状态(HRS)。涉及Hg TE的BTO(110)/ LSMO(110)多晶忆阻器表现出较小的忆阻作用(开关比)。由于较小的势垒高度,该效应随读取电压的增加而降低。 FTJ的LRS和HRS表现出近似相似的UV-Vis吸收光谱,这与LRS和HRS界面附近的BTO的价带最大值和LSMO的费米能级之间的小能量差一致。这种能量差源于基于FTJ的静电模型的LSMO的铁电极化和电荷屏蔽效应。

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