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Tuning band inversion symmetry of buckled III-Bi sheets by halogenation

机译:卤化弯曲的III-Bi片的调谐带反转对称性

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摘要

First-principles calculations are employed to investigate structural, electronic and topological insulating properties of XBi (X = B, Al, Ga, and In) monolayers upon halogenation. It is known that Y-XBi (X = Ga, In, Tl; Y = F, Cl, Br, I) can originate inversion-asymmetric topological insulators with large bulk band gaps. Our results suggest that Y-XBi (X = B, Al; Y = F, Cl, Br, I) may also result in nontrivial topological insulating phases. Despite the lower atomic number of B and Al, the spin-orbit coupling opens a band gap of about 400 meV in Y-XBi (X = B, Al), exhibiting an unusual electronic behavior for practical applications in spintronics. The nature of the bulk band gap and Dirac-cone edge states in their nanoribbons depends on the group-III elements and Y chemical species. They lead to a chemical tunability, giving rise to distinct band inversion symmetries and exhibiting Rashba-type spin splitting in the valence band of these systems. These findings indicate that a large family of Y-XBi sheets can exhibit nontrivial topological characteristics, by a proper tuning, and open a new possibility for viable applications at room temperature.
机译:第一性原理计算用于研究卤化后XBi(X = B,Al,Ga和In)单层的结构,电子和拓扑绝缘性能。众所周知,Y-XBi(X = Ga,In,Tl; Y = F,Cl,Br,I)可以引发具有大体积带隙的反对称非对称拓扑绝缘体。我们的结果表明,Y-XBi(X = B,Al; Y = F,Cl,Br,I)也可能导致非平凡的拓扑绝缘相。尽管B和Al的原子序数较低,但自旋轨道耦合在Y-XBi(X = B,Al)中打开了约400 meV的带隙,在自旋电子学中的实际应用中表现出不寻常的电子行为。纳米带中的体带隙和狄拉克锥边缘态的性质取决于III族元素和Y化学物种。它们导致化学可调性,引起明显的能带反转对称性,并在这些系统的价带中表现出Rashba型自旋分裂。这些发现表明,通过适当的调整,一大类Y-XBi片材可以表现出重要的拓扑特征,并为室温下可行的应用开辟了新的可能性。

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