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首页> 外文期刊>Nanotechnology >TiO2, SiO2, and Al2O3 coated nanopores and nanotubes produced by ALD in etched ion-track membranes for transport measurements
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TiO2, SiO2, and Al2O3 coated nanopores and nanotubes produced by ALD in etched ion-track membranes for transport measurements

机译:ALD在蚀刻的离子跟踪膜中通过ALD生产的TiO2,SiO2和Al2O3涂覆的纳米孔和纳米管,用于传输测量

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摘要

Low-temperature atomic layer deposition (ALD) of TiO2, SiO2, and Al2O3 was applied to modify the surface and to tailor the diameter of nanochannels in etched ion-track polycarbonate membranes. The homogeneity, conformity, and composition of the coating inside the nanochannels are investigated for different channel diameters (18-55 nm) and film thicknesses (5-22 nm). Small angle x-ray scattering before and after ALD demonstrates conformal coating along the full channel length. X-ray photoelectron spectroscopy and energy dispersive x-ray spectroscopy provide evidence of nearly stoichiometric composition of the different coatings. By wet-chemical methods, the ALD-deposited film is released from the supporting polymer templates providing 30 mu m long self-supporting nanotubes with walls as thin as 5 nm. Electrolytic ion-conductivity measurements provide proof-of-concept that combining ALD coating with ion-track nanotechnology offers promising perspectives for single-pore applications by controlled shrinking of an oversized pore to a preferred smaller diameter and fine-tuning of the chemical and physical nature of the inner channel surface.
机译:TiO2,SiO2和Al2O3的低温原子层沉积(ALD)用于修饰表面并调整离子蚀刻聚碳酸酯膜中纳米通道的直径。对于不同的通道直径(18-55 nm)和膜厚度(5-22 nm),研究了纳米通道内部涂层的均匀性,一致性和组成。 ALD前后的小角度X射线散射表明沿整个通道长度的保形涂层。 X射线光电子能谱和能量色散X射线能谱提供了不同涂层几乎化学计量组成的证据。通过湿化学方法,从支撑聚合物模板上释放出ALD沉积膜,从而提供了30微米长的自支撑纳米管,壁的厚度薄至5 nm。电解离子电导率测量提供了概念证明,即通过将超大孔径控制收缩至优选的较小直径以及化学和物理性质的微调,将ALD涂层与离子跟踪纳米技术相结合可为单孔应用提供广阔前景内部通道表面的角度。

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