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Silver catalyzed gallium phosphide nanowires integrated on silicon and in situ Ag-alloying induced bandgap transition

机译:银催化磷化镓纳米线集成在硅上和原位银合金诱导的带隙跃迁

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摘要

In this work, we demonstrate a silver catalyzed heteroepitaxial growth of gallium phosphide nanowires (GaP NWs) on silicon. The morphology and growth direction of GaP NWs on differently orientated Si substrates were investigated. From crystallographic analysis, we inferred that Ag from catalyst is incorporated into the GaP during the chemical beam epitaxy (CBE) process. Using the PL spectrum and time-resolved emission spectroscopy, the optical properties of Ag-catalyzed GaP NWs were greatly modified, with bandgap transitions in the blue range. The Raman characterizations further confirmed the Ag incorporation into GaP during the growth. From the bandgap calculations, it was deduced that Ag was substituted on the Ga site with bandgap broadening. The in situ Ag-alloying during the growth of Ag-catalyzed GaP NWs greatly modified the band structure of GaP, and could lead to further applications in optoelectronics for low-dimensional GaP-based nanomaterials.
机译:在这项工作中,我们证明了硅上磷化镓纳米线(GaP NWs)的银催化异质外延生长。研究了GaP NW在不同取向的Si衬底上的形貌和生长方向。从晶体学分析,我们推断在化学束外延(CBE)过程中,催化剂中的Ag被掺入了GaP中。使用PL光谱和时间分辨发射光谱,Ag催化的GaP NW的光学性质得到了很大的改变,带隙跃迁在蓝色范围内。拉曼特征进一步证实了在生长过程中Ag掺入了GaP中。从带隙计算可以推断出,Ag在Ga位点被带隙展宽所取代。在Ag催化的GaP NW的生长过程中原位Ag合金化极大地改变了GaP的能带结构,并可能导致在低维GaP基纳米材料的光电子学中的进一步应用。

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