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Ordered arrays of Au catalysts by FIB assisted heterogeneous dewetting

机译:FIB辅助异相去湿的有序Au催化剂阵列

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Synthesizing Au0.8Si0.2 nanocatalysts that are homogeneous in size and have controlled position is becoming a challenging and crucial prequisite for the fabrication of ordered semiconductor nanowires. In this study, Au0.8Si0.2 nanocatalysts are synthesized via dewetting of Au layers on Si(111) during thermal annealing in an ultra-high vacuum. In the first part of the paper, the mechanism of homogeneous dewetting is analyzed as a function of the Au-deposited thickness (hAu). We distinguish three different dewetting regimes: (I) for a low thickness (h(Au) <= 0.4 nm), a submonolyer coverage of Au is stabilized and there is no dewetting. (II) For an intermediate thickness (0.4 nm< h(Au) <= 5 nm), there is both dewetting and Au0.8Si0.2 phase formation. The size and density of the Au0.8Si0.2 clusters are directly related to hAu. When cooling down to room temperature, the clusters decompose and reject the Si at the Au/Si substrate interface. (III) For a large thickness (h(Au) > 5 nm), only dewetting takes place, without forming AuSi clusters. In this regime, the dewetting is kinetically controlled by the self-diffusion of Au (activation energy similar to 0.43 eV) without evidence of an Si-alloying effect. As a practical consequence, when relying solely on the homogeneous dewetting of Au/Si(111) to form the Au0.8Si0.2 catalysts (without a supply of Si atoms from vapor), regime II should be used to obtain good size and density control. In the second part of the paper, a process for ordering the catalysts using focused ion beam-(FIB) assisted dewetting (heterogeneous dewetting) is developed. We show that no matter what the FIB milling conditions and the Au nominal thickness are, dewetting is promoted by ion beam irradiation and is accompanied by the formation of Au0.8Si0.2 droplets. The droplets preferentially form on the patterned areas, while in similar annealing conditions, they do not form on the unpatterned areas. This behavior is attributed to the larger Au-Si interdiffusion in the patterned areas, which results from the Si amorphization induced by the FIB. A systematic analysis of the position of the nanodroplets shows their preferential nucleation inside the patterns, while thicker platelets of almost pure Au are observed between the patterns. The evolutions of the size homogeneity and the occupancy rate of the patterns are quantified as a function of the FIB dose and annealing temperature. Nice arrays of perfectly ordered AuSi catalysts are obtained after optimizing the FIB and dewetting conditions.
机译:尺寸均匀且位置受控的Au0.8Si0.2纳米催化剂的合成正成为制造有序半导体纳米线的挑战和关键条件。在这项研究中,Au0.8Si0.2纳米催化剂是通过在超高真空下进行热退火过程中对Si(111)上Au层进行去湿而合成的。在本文的第一部分中,根据金沉积厚度(hAu)来分析均匀去湿的机理。我们区分了三种不同的去湿方案:(I)对于低厚度(h(Au)<= 0.4 nm),Au的单单体覆盖率稳定并且没有去湿。 (II)对于中间厚度(0.4 nm 5 nm),仅进行去湿而不形成AuSi团簇。在这种情况下,通过Au的自扩散(活化能类似于0.43 eV)在动力学上控制去湿,而没有Si合金化作用的证据。实际的结果是,当仅依靠Au / Si(111)的均匀去湿以形成Au0.8Si0.2催化剂(不从蒸汽中提供Si原子)时,应使用方案II获得良好的尺寸和密度控制。在本文的第二部分中,开发了一种使用聚焦离子束-(FIB)辅助除湿(异质除湿)来订购催化剂的方法。我们表明,无论FIB研磨条件和Au标称厚度如何,离子束辐照都会促进去湿,并伴随形成Au0.8Si0.2小滴。液滴优先在图案化区域上形成,而在相似的退火条件下,它们不会在未图案化区域上形成。此行为归因于图案化区域中较大的Au-Si互扩散,这是由FIB引起的Si非晶化导致的。对纳米液滴位置的系统分析显示了它们在图案内部的优先成核,而在图案之间观察到了几乎纯金的较厚血小板。尺寸均匀性的变化和图案的占有率根据FIB剂量和退火温度来量化。在优化FIB和去湿条件后,可以获得排列整齐的AuSi催化剂。

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