...
首页> 外文期刊>Nanotechnology >Influencing factors on the size uniformity of self-assembled SiGe quantum rings grown by molecular beam epitaxy
【24h】

Influencing factors on the size uniformity of self-assembled SiGe quantum rings grown by molecular beam epitaxy

机译:影响分子束外延生长自组装SiGe量子环尺寸均匀性的因素

获取原文
获取原文并翻译 | 示例
           

摘要

The size uniformity of self-assembled SiGe quantum rings, which are formed by capping SiGe quantum dots with a thin Si layer, is found to be greatly influenced by the growth temperature and the areal density of SiGe quantum dots. Higher growth temperature benefits the size uniformity of quantum dots, but results in low Ge concentration as well as asymmetric Ge distribution in the dots, which induces the subsequently formed quantum rings to be asymmetric in shape or even broken somewhere in the ridge of rings. Low growth temperature degrades the size uniformity of quantum dots, and thus that of quantum rings. A high areal density results in the expansion and coalescence of neighboring quantum dots to form a chain, rather than quantum rings. Uniform quantum rings with a size dispersion of 4.6% and an areal density of 7.8 × 10 ~8 cm~(-2) are obtained at the optimized growth temperature of 640°C.
机译:发现通过用薄的Si层覆盖SiGe量子点而形成的自组装SiGe量子环的尺寸均匀性受到SiGe量子点的生长温度和面密度的极大影响。较高的生长温度有利于量子点的尺寸均匀性,但会导致低的Ge浓度以及点中Ge的不对称分布,这会导致随后形成的量子环形状不对称,甚至在环脊中的某个位置断裂。低的生长温度降低了量子点的尺寸均匀性,从而降低了量子环的尺寸均匀性。高的面密度导致相邻量子点的膨胀和聚结以形成链而不是量子环。在640℃的最佳生长温度下,获得了尺寸分散为4.6%,面密度为7.8×10〜8 cm〜(-2)的均匀量子环。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号