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Correlation between the magnetic imaging of cobalt nanoconstrictions and their magnetoresistance response

机译:钴纳米颈缩的磁成像与磁阻响应的相关性

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摘要

Scanning transmission x-ray microscopy (STXM) and magnetoresistance (MR) measurements are used to investigate the magnetic behavior of a nanoconstriction joining two micrometric electrodes (a pad and a wire). The reversal of the magnetization under variable external static magnetic fields is imaged. By means of a detailed analysis of the STXM images at the nanocontact area, the MR is calculated, based on diffusive anisotropic-MR. This MR agrees well with that obtained from electrical transport measurements, allowing a direct correlation between the MR signal and the magnetic reversal of the system. The magnetization behavior depends on the sample thickness and constriction dimensions. In 40nm-thick samples, with 20×175nm ~2 contact areas, the magnetization at the two sides of the constriction forms a net angle of 90°, with a progressive evolution of the magnetization structure between the electrodes during switching. The MR in those cases has a more peaked shape than with 20nm-thick electrodes and 10×80nm ~2 contact areas, where the magnetization forms 180°between them, with a wide domain wall pinned at the constriction. As a consequence of this configuration, a plateau in the MR is observed for about 20Oe.
机译:扫描透射X射线显微镜(STXM)和磁阻(MR)测量用于研究连接两个测微电极(焊盘和导线)的纳米缩颈的磁行为。对可变外部静磁场下的磁化强度反转进行了成像。通过对纳米接触区域的STXM图像的详细分析,基于扩散各向异性MR计算MR。该MR与从电传输测量获得的MR非常吻合,从而允许MR信号与系统的磁反转之间直接相关。磁化行为取决于样品的厚度和收缩尺寸。在具有20×175nm〜2接触面积的40nm厚样品中,收缩部两侧的磁化形成90°的净角,并且在切换过程中电极之间的磁化结构会逐渐发展。在那些情况下,MR具有比20nm厚的电极和10×80nm〜2接触区域更大的峰形,在它们之间磁化形成180°,在狭窄处钉有宽畴壁。由于这种构造,在MR中观察到约20Oe的平稳期。

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