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首页> 外文期刊>International Journal of Quantum Chemistry >Spin quenching of transition metals deposited on MgO insulator and CdO semiconductor density functional calculations
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Spin quenching of transition metals deposited on MgO insulator and CdO semiconductor density functional calculations

机译:沉积在MgO绝缘体上的过渡金属的自旋淬火和CdO半导体密度泛函计算

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摘要

We have analyzed spin quenching of first row transition metals deposited on (001) defect-free and defect-containing surfaces of MgO insulator and CdO semiconductor by means of density functional calculations and embedded cluster model. Clusters of moderate sizes were embedded in the simulated Coulomb fields that closely approximate the Madelung fields of the host surfaces, and relaxation of ions that surround the defect sites was taken into account. Spin states of metals deposited on the defect free surfaces were maintained as in the isolated metals except for Ti, V, and Co on MgO, and Ti, V, and Cr on CdO. On the defect containing surfaces, spin states were maintained too except for Fe on MgO, and V and Cr on CdO. The metal-support interactions stabilize the low spin state of the adsorbed metal with respect to the isolated metal, but the effect was not in general enough to quench the spin. Spin polarization effects tend to preserve the spin states of the adsorbed metals relative to those of the isolated metals. Although charge transfer took place from the adsorbed metal to the insulator surface, it took place the other way round from the semiconductor surface to the adsorbed metal. The encountered variations in magnetic properties were attributed to the smaller band gap of the semiconductor, and the behavior of a single metal atom adsorbed on a particular surface was a result of a competition between Hund's rule for the adsorbed metal and the formation of a chemical bond at the interface.
机译:我们已经通过密度泛函计算和嵌入式簇模型分析了沉积在MgO绝缘体和CdO半导体的(001)无缺陷和含缺陷的表面上的第一行过渡金属的自旋淬火。将中等大小的簇嵌入模拟的库仑场中,该场与宿主表面的马德隆场非常接近,并且考虑了围绕缺陷位点的离子的弛豫。除了在MgO上的Ti,V和Co和在CdO上的Ti,V和Cr之外,与在隔离的金属中一样,沉积在无缺陷表面上的金属的自旋态得以保持。在含有缺陷的表面上,除了MgO上的Fe和CdO上的V和Cr以外,还保持了自旋态。金属-载体相互作用相对于分离的金属稳定了吸附金属的低自旋态,但是该作用通常不足以淬灭自旋。自旋极化效应倾向于保持被吸附金属相对于被分离金属的自旋态。尽管电荷从吸附的金属转移到绝缘体表面,但是却从半导体表面转移到吸附的金属。所遇到的磁性能变化归因于半导体的较小带隙,并且吸附在特定表面上的单个金属原子的行为是吸附的金属的洪德定律与化学键形成之间竞争的结果在界面上。

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