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首页> 外文期刊>International Journal of Quantum Chemistry >Light Emission Due to the Quantum Confinement of Carriers in Silicon-Based Nanostructures
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Light Emission Due to the Quantum Confinement of Carriers in Silicon-Based Nanostructures

机译:硅基纳米结构中载流子的量子限制导致的发光

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In the field of Si nanoscale ultra large-scale integration, the quantum confinement effect is undesirable with respect to the device characteristics and performance because the carriers are entirely confined in nanoscale or low-dimensional structures. Significant efforts are being made with regard to the positive use of the quantum confinement effect in Si nanoscale structures. One such attempt is related to the use of Si optoelectronics and photonics for optical interconnections within a Si chip. In this study, the intrinsic electronic structures in the Si-based nanostructures with different dimensions and sizes as candidates for Si optoelectronics were investigated by the DV-X alpha molecular orbital calculation, which is advantageous to simulate the valence band structures for nanomaterials. We discuss the shift of a light emission peak to a higher energy due to the quantum confinement of carriers in the Si-based nanostructures, which depends on the sizes and numbers of structural dimensions, on the basis of the calculated results. Also, effect of doping of group RIB and VB elements in the periodic table on the extrinsic electronic structures of the Si-based nanostructures were clarified by combining the Vienna ab-initio code for determining the relaxation structures around the dopants with the DV-X alpha method for simulating the valence band structures. The results obtained are useful as a measure of possibility of the Si-based nano-structured materials for optoelectronics.
机译:在Si纳米级超大规模集成领域中,就器件特性和性能而言,量子限制效应是不希望的,因为载流子完全被限制在纳米级或低维结构中。关于在硅纳米级结构中积极使用量子限制效应,正在做出重大努力。一种这样的尝试涉及将Si光电和光子用于Si芯片内的光学互连。在这项研究中,通过DV-Xα分子轨道计算研究了具有不同尺寸和尺寸的Si基纳米结构中作为Si光电候选材料的本征电子结构,这有利于模拟纳米材料的价带结构。我们基于计算结果讨论了由于硅基纳米结构中载流子的量子限制而导致的发光峰向更高能量的转移,这取决于结构尺寸的大小和数量。此外,通过结合用于确定掺杂物周围的弛豫结构的维也纳ab-initio码和DV-X alpha,阐明了元素周期表中RIB和VB组元素的掺杂对Si基纳米结构的非本征电子结构的影响。价带结构的模拟方法。所获得的结果可用于测量用于光电子学的硅基纳米结构材料的可能性。

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