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Dwell-time algorithm for polishing large optics

机译:抛光大型光学器件的停留时间算法

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摘要

The calculation of the dwell time plays a crucial role in polishing precision large optics. Although some studies have taken place, it remains a challenge to develop a calculation algorithm which is absolutely stable, together with a high convergence ratio and fast solution speed even for extremely large mirrors. For this aim, we introduced a self-adaptive iterative algorithm to calculate the dwell time in this paper. Simulations were conducted in bonnet polishing (BP) to test the performance of this method on a real 430 mm × 430 mm fused silica part with the initial surface error PV = 1741.29 nm, RMS = 433.204 nm. The final surface residual error in the clear aperture after two simulation steps turned out to be PV = 11.7 nm, RMS = 0.5 nm. The results confirm that this method is stable and has a high convergence ratio and fast solution speed even with an ordinary computer. It is notable that the solution time is usually just a few seconds even on a 1000 mm × 1000 mm part. Hence, we believe that this method is perfectly suitable for polishing large optics. And not only can it be applied to BP, but it can also be applied to other subaperture deterministic polishing processes.
机译:停留时间的计算在抛光大型精密光学器件中起着至关重要的作用。尽管已经进行了一些研究,但要开发出绝对稳定的计算算法(即使对于非常大的反射镜也要具有很高的收敛率和快速的求解速度)仍然是一个挑战。为此,本文引入了一种自适应迭代算法来计算停留时间。在阀盖抛光(BP)中进行了仿真,以测试该方法在430 mm×430 mm熔融石英真实零件上的性能,初始表面误差PV = 1741.29 nm,RMS = 433.204 nm。经过两个模拟步骤后,透明孔径中的最终表面残留误差为PV = 11.7 nm,RMS = 0.5 nm。结果证实,即使使用普通计算机,该方法也稳定,收敛速度快,求解速度快。值得注意的是,即使在1000 mm×1000 mm的零件上,溶解时间通常也只有几秒钟。因此,我们认为该方法非常适合抛光大型光学器件。它不仅可以应用于BP,而且还可以应用于其他亚孔确定性抛光工艺。

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