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Research on quantum efficiency for reflection-mode InGaAs photocathodes with thin emission layer

机译:具有薄发射层的反射型InGaAs光阴极的量子效率研究

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In order to understand the photoemission mechanism of the reflection-mode InGaAs photocathode with a thin emission layer, the formula describing reflection-mode quantum efficiency is revised by solving the one-dimensional continuity equation, in which the electrons generated in the GaAs buffer layer are considered. Compared with the conventional formula, the revised formula is proved to be more suitable for the reflection-mode InGaAs photocathode with a thin emission layer. In experiment, the InGaAs sample goes through two-step surface preparation including a wet chemical cleaning process and a heat treatment process. Then the sample is activated by Cs/O and the experimental quantum efficiency curves are measured simultaneously every other hour. The measured results show that the shapes of the quantum efficiency curves degrade with time because of the contamination of residual gases in the vacuum system. All the quantum efficiency curves are well fitted by the revised formula. (C) 2015 Optical Society of America
机译:为了理解具有薄发射层的反射模式InGaAs光电阴极的光发射机理,通过求解一维连续方程修改了描述反射模式量子效率的公式,其中在GaAs缓冲层中产生的电子为考虑过的。与常规公式相比,该修正公式被证明更适合于具有薄发射层的反射模式InGaAs光电阴极。在实验中,InGaAs样品经过两步表面处理,包括湿法化学清洁过程和热处理过程。然后,样品通过Cs / O活化,每隔一小时同时测量一次实验量子效率曲线。测量结果表明,由于真空系统中残留气体的污染,量子效率曲线的形状随时间降低。修改后的公式可以很好地拟合所有量子效率曲线。 (C)2015年美国眼镜学会

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