Scattering losses in multidielectric structures designed for giant optical field enhancement

摘要

Multidielectric coatings are analytically designed to reach total absorption and maximum field enhancement at resonances. A resonant multi-dielectric stack was fabricated to be resonant at 633 nm for an incidence of 45° under TE-polarization. Field enhancement was expected to be around 1000. We discuss the mismatch with the enhancement measured using near field microscopy and using the scattering effect. In particular, scattering was investigated to serve as a far field characterization of such giant optical fields.