Investigation of a chalcohalide glass optical waveguide structure fabricated by dual-energy carbon-ion implantation

摘要

A planar waveguide structure in a chalcohalide glass was fabricated by dual-energy C ion implantation with energies of 5.5 and 6.0 MeV at fluences of 7.0 × 10~(14) and 8.0 × 10~(14) ions cm~(-2), respectively. A waveguide with a thickness of 5.9 μm was formed. SRIM 2013 was used to simulate the defect distribution fabricated by C ion implantation. Images of the polished end face of the C-implanted chalcohalide glass were measured with a metallographic microscope using reflected polarized light. The micro-Raman spectra were measured in air. The near-field intensity distributions were investigated at visible (633 nm) and near-infrared (1300, 1400, and 1539 nm) bands.