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Behavior of optical thin-film materials and coatings under proton and gamma irradiation

机译:质子和伽马射线辐照下的光学薄膜材料和涂层的行为

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摘要

Optical materials and coatings are exposed to the flux of energetic particles when used in either space applications or nuclear energy plants. The study of their behavior in such an environment is important to avoid failure of the optical components during their operation. The optical performance of several thin-film materials (HfO_2, Ta_2O_5, Nb_2O_5, TiO_2, SiO_2) and coatings, under irradiation with high-dose gamma rays (5.8 MGy) and exposure to low-energy (60 keV) protons, has been investigated. Some variations of optical properties have been detected in silicon oxide after irradiation, while the other materials are stable in such conditions.
机译:在空间应用或核能工厂中使用时,光学材料和涂层会暴露于高能粒子流中。在这种环境下研究其行为对于避免光学组件在其运行期间发生故障很重要。研究了几种薄膜材料(HfO_2,Ta_2O_5,Nb_2O_5,TiO_2,SiO_2)和涂层在高剂量伽马射线(5.8 MGy)辐射和低能(60 keV)质子照射下的光学性能。 。辐照后在氧化硅中检测到一些光学性质的变化,而其他材料在这种条件下是稳定的。

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