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Optimized pitch button blocking for polishing high-aspect-ratio optics

机译:优化的音调按钮阻挡,可抛光高纵横比的光学器件

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摘要

Pitch button blocking (PBB), involving attaching small pitch buttons between the back of a thin work-piece (i.e., optic) and a blocking plate, enables noncompliant convergent polishing in which the workpiece stiffness and block interface strength are maintained. This process has been optimized, and practical design criteria (number, size, and spacing of pitch buttons) have been determined both experimentally and theoretically using a thermoelastic model. The optimized PBB process has been successfully implemented on 100-265 mm sized workpieces with aspect ratios up to 45, resulting in maximum peak-to-valley heights of <|0.1| μm after blocking and polishing.
机译:间距按钮阻挡(PBB),涉及在薄的工件(即光学元件)的背面和阻挡板之间安装小间距按钮,可实现不均匀的会聚抛光,从而保持工件的刚度和阻挡界面强度。该过程已得到优化,并且已使用热弹性模型在实验和理论上确定了实用的设计标准(间距按钮的数量,大小和间距)。优化的PBB工艺已成功应用于尺寸比最大为45的100-265 mm尺寸的工件上,从而导致最大峰谷高度<| 0.1 |。封闭和抛光后的微米。

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