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Laser-induced damage of hafnia coatings as a function of pulse duration in the femtosecond to nanosecond range

机译:激光诱导的氧化f涂层的损伤与飞秒至毫微秒范围内的脉冲持续时间有关

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摘要

Laser-damage thresholds and morphologies of hafnia single layers exposed under femtosecond, picose-cond, and nanosecond single pulses (1030/1064 nm) are reported. The samples were made with different deposition parameters in order to study how the damage behavior of the samples evolves with the pulse duration and how it is linked to the deposition process. In the femtosecond to picosecond regime, the scaling law of the laser-induced damage threshold as a function of pulse duration is in good agreement with the models of photo and avalanche ionization based on the rate equation for free electron generation. However, differences in the damage morphologies between samples are shown. No correlation between the nanosecond and femtosecond/picosecond laser-damage resistance of hafnia coatings could be established. We also report evidence of the transition in damage mechanisms for hafnia, from an ablation process linked to intrinsic properties of the material to a defect-induced process, that exists between a few picoseconds and a few tens of picoseconds.
机译:报告了在飞秒,皮秒和纳秒单脉冲(1030/1064 nm)下暴露的ha的单层的激光损伤阈值和形貌。用不同的沉积参数制备样品,以研究样品的破坏行为如何随脉冲持续时间演变以及如何与沉积过程联系在一起。在飞秒到皮秒级的条件下,激光诱导的损伤阈值的缩放定律作为脉冲持续时间的函数与基于自由电子生成速率方程的光电子和雪崩电离模型非常吻合。但是,显示了样品之间的损伤形态差异。哈夫尼亚涂层的纳秒级和飞秒/皮秒级的激光损伤抵抗力之间没有相关性。我们还报告了氧化镁破坏机理的证据,从与材料的固有特性相关的消融过程到由缺陷引起的过程,这些过程存在于几皮秒和几十皮秒之间。

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